Hayashi Pure Chemical Ind.,Ltd.

Roughening Etchant

GaN(N-face) Roughening EtchantPure Etch F1000 series

 Features of the product

  • Excellent etching for making roughness on surface of GaN film (N-face)
  • Forming desirable asperity, improving the light extraction efficiency
  • Capable of using from room temperature to high temperature
  • Excellent uniformity of asperity profile
  • Etchant for full etching is also available. Contact us for more details.

Catalog information

Catalog of Functional Chemicals is available.
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