GaN（N-face） Roughening EtchantPure Etch F1000 series
- Excellent etching for making roughness on surface of GaN film (N-face)
- Forming desirable asperity, improving the light extraction efficiency
- Capable of using from room temperature to high temperature
- Excellent uniformity of asperity profile
- Etchant for full etching is also available. Contact us for more details.