GaP Roughening EtchantPure Etch F200 series
- Excellent etching for making roughness on GaP film surface, GaP substrate surface, incline, and side
- Forming desirable asperity, improving the light extraction efficiency
- Capable of using at low temperature and in a short time
- Excellent uniformity of asperity profile
- Etchant for full etching is also available. Contact us for more details.